@inbook{0195b00229ef41c0bb19217f265697c7,
title = "Ni, Pt, and Ti stanogermanide formation on Ge0.92Sn0.08",
abstract = "The aim of this work is to provide a systematic and comparative study on the material characteristics and electrical contact performance for a germanium-tin (GeSn) alloy with a high percentage of Sn (8\%). Thin metal films (10 nm) of Nickel (Ni), Titanium (Ti), or Platinum (Pt) were deposited on Ge0.92Sn0.08 layers and subsequently annealed at different temperatures ranging from 300°C up to 500°C. Various experimental techniques were employed to characterize the metal morphology and the electrical contact behavior, with the intention of identifying the most promising metal candidate, in terms of low sheet resistance and low surface roughness, considering a low formation temperature. The investigations carried out show that for nano-electronic contact applications, nickel-stanogermanide (NiGeSn) turns out to be the most promising candidate among the three different metals analyzed. NiGeSn presents low sheet resistance combined with low formation temperatures, below 400°C; PtGeSn shows better thermal stability when compared to the other two options while, Ti was found to be unreactive below 500°C, resulting in incomplete TiGeSn formation.",
keywords = "GeSn, sheet resistance, stanogermanide",
author = "Emmanuele Galluccio and Nikolay Petkov and Gioele Mirabelli and Jessica Doherty and Lin, \{Shih Va\} and Lu, \{Fang Liang\} and Liu, \{Chee Wee\} and Holmes, \{Justin D.\} and Ray Duffy",
note = "Publisher Copyright: {\textcopyright} 2019 IEEE.; 2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019 ; Conference date: 01-04-2019 Through 03-04-2019",
year = "2019",
month = apr,
doi = "10.1109/EUROSOI-ULIS45800.2019.9041907",
language = "English",
series = "2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019",
address = "United States",
}