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Optical investigation of exciton localization in Alx Ga1-x N

  • K. B. Lee
  • , P. J. Parbrook
  • , T. Wang
  • , F. Ranalli
  • , T. Martin
  • , R. S. Balmer
  • , D. J. Wallis
  • University of Sheffield
  • QinetiQ

Research output: Contribution to journalArticlepeer-review

Abstract

The optical properties of Alx Ga1-x N epilayers with x ranging from 0.08 to 0.52 have been studied by photoluminescence (PL). The temperature dependent PL of the Alx Ga1-x N epilayers shows a classical "S-shape" behavior. This behavior is attributed to exciton localization due to compositional fluctuations in the Alx Ga1-x N layers. The localization parameter extracted from temperature dependent PL, which gives an estimate of degree of localization, is found to increase with Al composition, up to a value of 52 meV at the highest Al composition studied. Several phonon replicas are observed at the lower energy side of the main excitonic emission peak in these epilayers at low temperature. In all cases, the Huang-Rhys parameter has been estimated. The Huang-Rhys parameter is found to increase with x indicating that the degree of localization again increases with x. In addition, the Huang-Rhys parameter is found to increase with higher order phonon replicas.

Original languageEnglish
Article number053513
JournalJournal of Applied Physics
Volume101
Issue number5
DOIs
Publication statusPublished - 2007
Externally publishedYes

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