Skip to main navigation Skip to search Skip to main content

Optimisation of AlGaN/GaN Heterostructures for Field Effect Transistors Grown by Metalorganic Vapour Phase Epitaxy

  • P. J. Parbrook
  • , D. A. Wood
  • , W. S. Tan
  • , P. A. Houston
  • , G. Hill
  • , C. R. Whitehouse
  • , R. W. Martin
  • , C. Trager-Cowan
  • , A. Watt

Research output: Contribution to journalArticlepeer-review

Abstract

The influence of both the AlGaN barrier and GaN underlayer in single heterostructures has bees examined. The results show that room temperature Hall measurements can lead to an overestimate of the sheet carrier concentration due to bulk contributions. Orders of magnitude increase of in the GaN resistivity can be achieved by reducing the growth temperature. The luminescence properties of the structure have been examined by cathodoluminescence showing strong features attributable to the two-dimensional electron gas.

Original languageEnglish
Pages (from-to)227-231
Number of pages5
JournalPhysica Status Solidi (A) Applied Research
Volume188
Issue number1
DOIs
Publication statusPublished - Nov 2001
Externally publishedYes

Fingerprint

Dive into the research topics of 'Optimisation of AlGaN/GaN Heterostructures for Field Effect Transistors Grown by Metalorganic Vapour Phase Epitaxy'. Together they form a unique fingerprint.

Cite this