Abstract
Bandwidth measurements of deep ultra-violet micro-light-emitting diode (LED) electroluminescence centred at 250 nm using a multiple quantum well aluminium gallium nitride (AlGaN)-based LED structure grown on a sapphire substrate is presented. By controlled etching of the wafer surface, parabolically shaped micro-LED structures were formed to enhance light emission through the substrate. Devices were tested on-wafer and bandwidth measurements were carried out on individual emission peaks from the devices. A bandwidth of more than 20 MHz was achieved on the 250 nm peak.
| Original language | English |
|---|---|
| Pages (from-to) | 354-355 |
| Number of pages | 2 |
| Journal | Electronics Letters |
| Volume | 51 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 19 Feb 2015 |
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