Performance and reliability in back-gated CVD-grown MoS2 devices

Research output: Contribution to journalArticlepeer-review

Abstract

In this work, the electrical performance and reliability of as-synthesized CVD-grown MoS2 transistors directly grown on SiO2/Si substrate without any transfer process have been evaluated. Transfer and output characteristics, current hysteresis, capacitance-voltage and low-frequency noise signatures have been characterized revealing the huge influence of surface and oxide defects and the disturbance due to the fluctuations of the carrier number on the back-gated transistor response.

Original languageEnglish
Article number108173
JournalSolid-State Electronics
Volume186
DOIs
Publication statusPublished - Dec 2021

Keywords

  • Low-frequency noise
  • Molybdenum disulfide
  • More than Moore
  • MoS
  • Reliability
  • Transition metal dichalcogenide
  • Two-dimensional materials

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