Abstract
In this work, the electrical performance and reliability of as-synthesized CVD-grown MoS2 transistors directly grown on SiO2/Si substrate without any transfer process have been evaluated. Transfer and output characteristics, current hysteresis, capacitance-voltage and low-frequency noise signatures have been characterized revealing the huge influence of surface and oxide defects and the disturbance due to the fluctuations of the carrier number on the back-gated transistor response.
| Original language | English |
|---|---|
| Article number | 108173 |
| Journal | Solid-State Electronics |
| Volume | 186 |
| DOIs | |
| Publication status | Published - Dec 2021 |
Keywords
- Low-frequency noise
- Molybdenum disulfide
- More than Moore
- MoS
- Reliability
- Transition metal dichalcogenide
- Two-dimensional materials
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