Phase and surface roughness evolution for as-deposited LPCVD silicon films
- C. Cobianu
- , R. Plugaru
- , N. Nastase
- , S. Nastase
- , C. Flueraru
- , M. Modreanu
- , J. Adamczevska
- , W. Paszkowicz
- , J. Auleytner
- , P. Cosmin
- National Institute for Research and Development in Microtechnologies Romania
- Polish Academy of Sciences
- Catalyst Semiconductor
Research output: Contribution to journal › Article › peer-review