Phase and surface roughness evolution for as-deposited LPCVD silicon films
- C. Cobianu
- , Rodica Plugaru
- , Nicoleta Nastase
- , S. Nastase
- , C. Flueraru
- , M. Modreanu
- , J. Adamczevska
- , W. Paszkowicz
- , J. Auleytner
- , P. Cosmin
- National Institute for Research and Development in Microtechnologies Romania
Research output: Contribution to conference › Paper › peer-review