Photoreflectance study of AlGaN/GaN heterostructures grown by MOCVD process

  • Anna Wójcik
  • , Tomasz Piwoński
  • , Tomasz J. Ochalski
  • , Emil Kowalczyk
  • , Maciej Bugajski
  • , Andrzej Grzegorczyk
  • , Łukasz Macht
  • , Soufien Haffouz
  • , Poul K. Larsen

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper we report the results of photoreflectance (PR) spectroscopy of GaN/AlGaN heterostructures used for realisation of high electron mobility transistors (HEMTs). For the proper operation of such structures a triangular quantum well created at the interface between GaN and AlGaN is required. Due to quantum confinement in this area 2DEG is created. The data obtained from PR technique allow to estimate a real shape of 2DEG confinement potential, what is necessary for verification of design and correctness of the growth process.

Original languageEnglish
Pages (from-to)431-435
Number of pages5
JournalOptica Applicata
Volume32
Issue number3
Publication statusPublished - 2002
Externally publishedYes

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