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Physical, chemical and electrical characterisation of the diffusion of copper in silicon dioxide and prevention via a CuAl alloy barrier layer system

  • C. Byrne
  • , B. Brennan
  • , R. Lundy
  • , J. Bogan
  • , A. Brady
  • , Y. Y. Gomeniuk
  • , S. Monaghan
  • , P. K. Hurley
  • , G. Hughes
  • Dublin City University
  • National Physical Laboratory
  • University of Limerick
  • NASU - Institute of Semiconductors Physics

Research output: Contribution to journal › Article › peer-review

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