Plasma-enhanced atomic layer deposition of AlPO4/AlPxOy: comparing dual source and supercycle approaches for composition control

  • Florian Preischel
  • , D. Zanders
  • , J.-P. Glauber
  • , K. Rönnby
  • , D. Rogalla
  • , Thomas Gemming
  • , Peter Dement
  • , M. Nolan
  • , A. Devi

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