Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures

Justin D. Holmes

doi:10.4028/www.scientific.net/msf.555.29

Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures

Justin D. Holmes

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Materials Science Forum
DOIs	https://doi.org/10.4028/www.scientific.net/msf.555.29
Publication status	Published - 2007

Keywords

Materials science
Copolymer
Polystyrene
Silicon
Nanostructure
Polymer
Lithography
Nanotechnology
Composite material
Optoelectronics

Access to Document

10.4028/www.scientific.net/msf.555.29

https://openalex.org/W2068292853Licence: CC BY-NC-ND

Cite this

@article{4a96d3c7dbd143fa92471f7eef9c0b03,

title = "Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures",

keywords = "Materials science, Copolymer, Polystyrene, Silicon, Nanostructure, Polymer, Lithography, Nanotechnology, Composite material, Optoelectronics",

author = "Holmes, \{Justin D.\}",

year = "2007",

doi = "10.4028/www.scientific.net/msf.555.29",

language = "English",

journal = "Materials Science Forum",

issn = "0255-5476",

publisher = "Trans Tech Publications Ltd",

}

TY - JOUR

T1 - Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures

AU - Holmes, Justin D.

PY - 2007

Y1 - 2007

KW - Materials science

KW - Copolymer

KW - Polystyrene

KW - Silicon

KW - Nanostructure

KW - Polymer

KW - Lithography

KW - Nanotechnology

KW - Composite material

KW - Optoelectronics

U2 - 10.4028/www.scientific.net/msf.555.29

DO - 10.4028/www.scientific.net/msf.555.29

M3 - Article

SN - 0255-5476

JO - Materials Science Forum

JF - Materials Science Forum

ER -