Precursors for chemical vapor deposition of yttrium barium copper oxide

D. J. Otway; B. Obi; W. S. Rees

doi:10.1016/S0925-8388(96)02682-5

Precursors for chemical vapor deposition of yttrium barium copper oxide

D. J. Otway
, B. Obi
, W. S. Rees

Georgia Institute of Technology

Research output: Contribution to journal › Article › peer-review

Abstract

There exists a need for reproducible large area, high quality, thin films of YBa₂Cu₃O_7-δ for insertion into magnetic resonance imaging and cellular base station applications. One approach to the fabrication of these films, chemical vapor deposition, currently has some limitations placed upon it by the available range of precursor compounds. This report discusses the present commercial options, with an emphasis on the effort demanded to qualify a specific compound for utilization in a manufacturing environment.

Original language	English
Pages (from-to)	254-263
Number of pages	10
Journal	Journal of Alloys and Compounds
Volume	251
Issue number	1-2
DOIs	https://doi.org/10.1016/S0925-8388(96)02682-5
Publication status	Published - Apr 1997
Externally published	Yes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

Chemical vapour deposition
MOCVD
Thin films
YBCO

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10.1016/S0925-8388(96)02682-5

Cite this

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title = "Precursors for chemical vapor deposition of yttrium barium copper oxide",

abstract = "There exists a need for reproducible large area, high quality, thin films of YBa2Cu3O7-δ for insertion into magnetic resonance imaging and cellular base station applications. One approach to the fabrication of these films, chemical vapor deposition, currently has some limitations placed upon it by the available range of precursor compounds. This report discusses the present commercial options, with an emphasis on the effort demanded to qualify a specific compound for utilization in a manufacturing environment.",

keywords = "Chemical vapour deposition, MOCVD, Thin films, YBCO",

author = "Otway, \{D. J.\} and B. Obi and Rees, \{W. S.\}",

year = "1997",

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doi = "10.1016/S0925-8388(96)02682-5",

language = "English",

volume = "251",

pages = "254--263",

journal = "Journal of Alloys and Compounds",

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AU - Otway, D. J.

AU - Obi, B.

AU - Rees, W. S.

PY - 1997/4

Y1 - 1997/4

N2 - There exists a need for reproducible large area, high quality, thin films of YBa2Cu3O7-δ for insertion into magnetic resonance imaging and cellular base station applications. One approach to the fabrication of these films, chemical vapor deposition, currently has some limitations placed upon it by the available range of precursor compounds. This report discusses the present commercial options, with an emphasis on the effort demanded to qualify a specific compound for utilization in a manufacturing environment.

AB - There exists a need for reproducible large area, high quality, thin films of YBa2Cu3O7-δ for insertion into magnetic resonance imaging and cellular base station applications. One approach to the fabrication of these films, chemical vapor deposition, currently has some limitations placed upon it by the available range of precursor compounds. This report discusses the present commercial options, with an emphasis on the effort demanded to qualify a specific compound for utilization in a manufacturing environment.

KW - Chemical vapour deposition

KW - MOCVD

KW - Thin films

KW - YBCO

UR - https://www.scopus.com/pages/publications/0031123240

U2 - 10.1016/S0925-8388(96)02682-5

DO - 10.1016/S0925-8388(96)02682-5

M3 - Article

AN - SCOPUS:0031123240

SN - 0925-8388

VL - 251

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JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

IS - 1-2

ER -

Precursors for chemical vapor deposition of yttrium barium copper oxide

Abstract

UN SDGs

Keywords

Access to Document

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