Preparation of mesoporous titania thin films with remarkably high thermal stability

Kaixue Wang; Michael A. Morris; Justin D. Holmes

doi:10.1021/cm047912a

Preparation of mesoporous titania thin films with remarkably high thermal stability

Kaixue Wang
, Michael A. Morris
, Justin D. Holmes

School of Chemistry

University College Cork

Research output: Contribution to journal › Article › peer-review

Abstract

(Graph Presented) High-quality crack-free mesoporous titania thin films on silicon wafers or glass slides by spin-coating method. The thermal stability of these crystalline films can be remarkably enthanced, up to 850°C, by post-treatment of the film in supercritical carbon dioxide with the presence of a small amount of tetramethoxysilane.

Original language	English
Pages (from-to)	1269-1271
Number of pages	3
Journal	Chemistry of Materials
Volume	17
Issue number	6
DOIs	https://doi.org/10.1021/cm047912a
Publication status	Published - 22 Mar 2005

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10.1021/cm047912a

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@article{82716879f8ee4b1293107a03d44c1224,

title = "Preparation of mesoporous titania thin films with remarkably high thermal stability",

abstract = "(Graph Presented) High-quality crack-free mesoporous titania thin films on silicon wafers or glass slides by spin-coating method. The thermal stability of these crystalline films can be remarkably enthanced, up to 850°C, by post-treatment of the film in supercritical carbon dioxide with the presence of a small amount of tetramethoxysilane.",

author = "Kaixue Wang and Morris, \{Michael A.\} and Holmes, \{Justin D.\}",

year = "2005",

month = mar,

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doi = "10.1021/cm047912a",

language = "English",

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journal = "Chemistry of Materials",

issn = "0897-4756",

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T1 - Preparation of mesoporous titania thin films with remarkably high thermal stability

AU - Wang, Kaixue

AU - Morris, Michael A.

AU - Holmes, Justin D.

PY - 2005/3/22

Y1 - 2005/3/22

N2 - (Graph Presented) High-quality crack-free mesoporous titania thin films on silicon wafers or glass slides by spin-coating method. The thermal stability of these crystalline films can be remarkably enthanced, up to 850°C, by post-treatment of the film in supercritical carbon dioxide with the presence of a small amount of tetramethoxysilane.

AB - (Graph Presented) High-quality crack-free mesoporous titania thin films on silicon wafers or glass slides by spin-coating method. The thermal stability of these crystalline films can be remarkably enthanced, up to 850°C, by post-treatment of the film in supercritical carbon dioxide with the presence of a small amount of tetramethoxysilane.

UR - https://www.scopus.com/pages/publications/15444372480

U2 - 10.1021/cm047912a

DO - 10.1021/cm047912a

M3 - Article

AN - SCOPUS:15444372480

SN - 0897-4756

VL - 17

SP - 1269

EP - 1271

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 6

ER -

Preparation of mesoporous titania thin films with remarkably high thermal stability

Abstract

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