TY - GEN
T1 - Quasi-likelihood deconvolution of non-gaussian non-invertible moving average model
AU - Zhang, Mingshan
AU - Huang, Jian
PY - 2013
Y1 - 2013
N2 - In reflection seismology the reflectivity sequence is of primary interest and must be estimated. Estimation of the reflectivity sequence is based on deconvolution of seismic trace data. Modelling the seismic trace as the non-Gaussian moving average time series, we propose a deconvolution method based on the modified L2 estimation, which is consistent estimation of moving average models with heavy tailed error distribution. The asymptotical equivalence is established between the proposed method and the deconvolution using O21. Simulation studies are presented to validate the equivalency. Furthermore, based on this equivalence the consistency problem of the O21 deconvolution has been discussed.
AB - In reflection seismology the reflectivity sequence is of primary interest and must be estimated. Estimation of the reflectivity sequence is based on deconvolution of seismic trace data. Modelling the seismic trace as the non-Gaussian moving average time series, we propose a deconvolution method based on the modified L2 estimation, which is consistent estimation of moving average models with heavy tailed error distribution. The asymptotical equivalence is established between the proposed method and the deconvolution using O21. Simulation studies are presented to validate the equivalency. Furthermore, based on this equivalence the consistency problem of the O21 deconvolution has been discussed.
KW - Minimum entropy deconvolution
KW - Moving average model
KW - Non-minimum-phase model
KW - Reflection seismology
UR - https://www.scopus.com/pages/publications/84871684230
U2 - 10.4028/www.scientific.net/AMR.605-607.1781
DO - 10.4028/www.scientific.net/AMR.605-607.1781
M3 - Conference proceeding
AN - SCOPUS:84871684230
SN - 9783037855447
T3 - Advanced Materials Research
SP - 1781
EP - 1787
BT - Advanced Designs and Researches for Manufacturing
T2 - 2nd International Conference on Materials and Products Manufacturing Technology, ICMPMT 2012
Y2 - 22 September 2012 through 23 September 2012
ER -