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Reduction of the thermal conductivity in free-standing silicon nano-membranes investigated by non-invasive Raman thermometry

  • E. Chávez-Ángel
  • , J. S. Reparaz
  • , J. Gomis-Bresco
  • , M. R. Wagner
  • , J. Cuffe
  • , B. Graczykowski
  • , A. Shchepetov
  • , H. Jiang
  • , M. Prunnila
  • , J. Ahopelto
  • , F. Alzina
  • , C. M. Sotomayor Torres

Research output: Contribution to journalArticlepeer-review

Abstract

We report on the reduction of the thermal conductivity in ultra-thin suspended Si membranes with high crystalline quality. A series of membranes with thicknesses ranging from 9 nm to 1.5 μm was investigated using Raman thermometry, a novel contactless technique for thermal conductivity determination. A systematic decrease in the thermal conductivity was observed as reducing the thickness, which is explained using the Fuchs-Sondheimer model through the influence of phonon boundary scattering at the surfaces. The thermal conductivity of the thinnest membrane with d = 9 nm resulted in (9 ± 2) W/mK, thus approaching the amorphous limit but still maintaining a high crystalline quality.

Original languageEnglish
Article number012113
JournalAPL Materials
Volume2
Issue number1
DOIs
Publication statusPublished - Jan 2014
Externally publishedYes

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