Scaling CMOS beyond Si FinFET: An analog/RF perspective

  • B. Parvais
  • , G. Hellings
  • , M. Simicic
  • , P. Weckx
  • , J. Mitard
  • , D. Jang
  • , V. Deshpande
  • , B. Van Liempc
  • , A. Veloso
  • , A. Vandooren
  • , N. Waldron
  • , P. Wambacq
  • , N. Collaert
  • , D. Verkest

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

FinFET has been introduced in the 22/16nm node to continue CMOS logic scaling. The very tight pitches foreseen for the coming generation necessitate the introduction of different scaling boosters. In this paper, we review how these elements affect the analog device performance. The benefits of alternative channel material for dedicated RF applications and the related integration challenges are also discussed.

Original languageEnglish
Title of host publication2018 48th European Solid-State Device Research Conference, ESSDERC 2018
PublisherEditions Frontieres
Pages158-161
Number of pages4
ISBN (Electronic)9781538654019
DOIs
Publication statusPublished - 8 Oct 2018
Externally publishedYes
Event48th European Solid-State Device Research Conference, ESSDERC 2018 - Dresden, Germany
Duration: 3 Sep 20186 Sep 2018

Publication series

NameEuropean Solid-State Device Research Conference
Volume2018-September
ISSN (Print)1930-8876

Conference

Conference48th European Solid-State Device Research Conference, ESSDERC 2018
Country/TerritoryGermany
CityDresden
Period3/09/186/09/18

Fingerprint

Dive into the research topics of 'Scaling CMOS beyond Si FinFET: An analog/RF perspective'. Together they form a unique fingerprint.

Cite this