Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine

E. Fritsch; E. Mächler; F. Arrouy; H. Berke; I. Povey; P. R. Willmott; J. P. Locquet

doi:10.1116/1.580214

Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine

E. Fritsch
, E. Mächler
, F. Arrouy
, H. Berke
, I. Povey
, P. R. Willmott
, J. P. Locquet

Research output: Contribution to journal › Article › peer-review

Abstract

A new precursor compound for the deposition of copper oxide thin films under molecular beam conditions, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial copper oxide thin films on MgO.

Original language	English
Pages (from-to)	3208-3213
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	14
Issue number	6
DOIs	https://doi.org/10.1116/1.580214
Publication status	Published - 1996
Externally published	Yes

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Fritsch, E., Mächler, E., Arrouy, F., Berke, H., Povey, I., Willmott, P. R., & Locquet, J. P. (1996). Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 14(6), 3208-3213. https://doi.org/10.1116/1.580214

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title = "Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine",

abstract = "A new precursor compound for the deposition of copper oxide thin films under molecular beam conditions, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial copper oxide thin films on MgO.",

author = "E. Fritsch and E. M{\"a}chler and F. Arrouy and H. Berke and I. Povey and Willmott, \{P. R.\} and Locquet, \{J. P.\}",

year = "1996",

doi = "10.1116/1.580214",

language = "English",

volume = "14",

pages = "3208--3213",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "6",

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Fritsch, E, Mächler, E, Arrouy, F, Berke, H, Povey, I, Willmott, PR & Locquet, JP 1996, 'Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 14, no. 6, pp. 3208-3213. https://doi.org/10.1116/1.580214

Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine. / Fritsch, E.; Mächler, E.; Arrouy, F. et al.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 14, No. 6, 1996, p. 3208-3213.

Research output: Contribution to journal › Article › peer-review

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T1 - Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine

AU - Fritsch, E.

AU - Mächler, E.

AU - Arrouy, F.

AU - Berke, H.

AU - Povey, I.

AU - Willmott, P. R.

AU - Locquet, J. P.

PY - 1996

Y1 - 1996

N2 - A new precursor compound for the deposition of copper oxide thin films under molecular beam conditions, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial copper oxide thin films on MgO.

AB - A new precursor compound for the deposition of copper oxide thin films under molecular beam conditions, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial copper oxide thin films on MgO.

UR - https://www.scopus.com/pages/publications/0030505907

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DO - 10.1116/1.580214

M3 - Article

AN - SCOPUS:0030505907

SN - 0734-2101

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SP - 3208

EP - 3213

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 6

ER -

Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine

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