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Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: Fabrication of inorganic nanostructured etchmask for lithographic use

  • C. Cummins
  • , D. Borah
  • , S. Rasappa
  • , A. Chaudhari
  • , T. Ghoshal
  • , B. M.D. O'Driscoll
  • , P. Carolan
  • , N. Petkov
  • , J. D. Holmes
  • , M. A. Morris
  • Trinity College Dublin

Research output: Contribution to journal › Article › peer-review

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