Sensitivity analysis and fine tuning of em simulation for cpw transmission line characterization

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

This paper addresses the issue of thin-film characterization through wafer-probe measurements and electromagnetic simulation (EM simulation). The parameters are optimized to get the best fit between measured and simulated S-parameters. Based on the results obtained an optimization methodology for modeling the test structure is presented. The optimization methodology has been verified by investigating the S-parameters of Coplanar-Waveguide (CPW) transmission lines with a known SiO2 layer using CAD simulations and two-port S-parameter measurements up to 6 GHz. The combination of CAD simulation and S-parameter measurement is shown to be suitable for characterization of dielectric materials.

Original languageEnglish
Title of host publication2009 Ph.D. Research in Microelectronics and Electronics, PRIME 2009
Pages260-263
Number of pages4
DOIs
Publication statusPublished - 2009
Event2009 Ph.D. Research in Microelectronics and Electronics, PRIME 2009 - Cork, Ireland
Duration: 12 Jul 200917 Jul 2009

Publication series

Name2009 Ph.D. Research in Microelectronics and Electronics, PRIME 2009

Conference

Conference2009 Ph.D. Research in Microelectronics and Electronics, PRIME 2009
Country/TerritoryIreland
CityCork
Period12/07/0917/07/09

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