Soft breakdown in MgO dielectric layers

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Abstract

In this work, we report on the occurrence of the soft breakdown (SBD) failure mode in 20nm-thick films of magnesium oxide (MgO) grown on Si substrates. To our knowledge, this is the first observation of this failure mechanism in a high-κ gate dielectric with such a large oxide thickness. We show that the I-V characteristics follow the power-law dependence typical of SBD conduction in a wider voltage range than that reported for SiO2. We pay special attention to the relationship between the magnitude of the current and the normalized differential conductance, and analyze the role played by the injection polarity and substrate type.

Original languageEnglish
Title of host publication2009 IEEE International Reliability Physics Symposium, IRPS 2009
Pages688-691
Number of pages4
DOIs
Publication statusPublished - 2009
Event2009 IEEE International Reliability Physics Symposium, IRPS 2009 - Montreal, QC, Canada
Duration: 26 Apr 200930 Apr 2009

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
ISSN (Print)1541-7026

Conference

Conference2009 IEEE International Reliability Physics Symposium, IRPS 2009
Country/TerritoryCanada
CityMontreal, QC
Period26/04/0930/04/09

Keywords

  • Breakdown
  • High-κ
  • MgO

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