Abstract
In this paper we propose a new technology to obtain SOI (silicon - on - isolator) substrates. This new technology is based on silicon direct bonding techniques using hydrophilic surfaces. The obtained substrates can be used in MOEMS for ingression of light sources. This method is high versatile and provides a high degree flexibility in materials integration.
| Original language | English |
|---|---|
| Pages | 531-534 |
| Number of pages | 4 |
| Publication status | Published - 2000 |
| Externally published | Yes |
| Event | 2000 International Semiconductor Conference - Sinaia, Romania Duration: 10 Oct 2000 → 14 Oct 2000 |
Conference
| Conference | 2000 International Semiconductor Conference |
|---|---|
| Country/Territory | Romania |
| City | Sinaia |
| Period | 10/10/00 → 14/10/00 |
Fingerprint
Dive into the research topics of 'SOI materials for MOEMS obtained by silicon direct bonding technique'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver