SOI materials for MOEMS obtained by silicon direct bonding technique

  • C. Dunare
  • , I. Cernica
  • , D. Popescu
  • , A. Popescu
  • , D. Cristea
  • , M. Modreanu
  • , E. Manea

Research output: Contribution to conferencePaperpeer-review

Abstract

In this paper we propose a new technology to obtain SOI (silicon - on - isolator) substrates. This new technology is based on silicon direct bonding techniques using hydrophilic surfaces. The obtained substrates can be used in MOEMS for ingression of light sources. This method is high versatile and provides a high degree flexibility in materials integration.

Original languageEnglish
Pages531-534
Number of pages4
Publication statusPublished - 2000
Externally publishedYes
Event2000 International Semiconductor Conference - Sinaia, Romania
Duration: 10 Oct 200014 Oct 2000

Conference

Conference2000 International Semiconductor Conference
Country/TerritoryRomania
CitySinaia
Period10/10/0014/10/00

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