Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

R. J. Holdsworth; P. A. Martin; D. Raisbeck; J. Rivero; H. E. Sanders; D. Sheel; M. E. Pemble

Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

R. J. Holdsworth
, P. A. Martin
, D. Raisbeck
, J. Rivero
, H. E. Sanders
, D. Sheel
, M. E. Pemble

Research output: Contribution to journal › Article › peer-review

Abstract

Static vapor pressure measurements of volatile metal precursors, in the pressure range 10^-1 Pa to 10³ Pa, are described. The vapor pressures and the sublimation or evaporation enthalpies, in the range 265 K-300 K, of Mo(CO)₆ (77.7 kJ mol^-1), two dimethyl(β-diketonato)gold(III) complexes, Me₂Au(tfa) (83.5 kJ mol^-1) and Me₂(hfa) (68.1 kJ mol^-1), and an inorganic Rh precursor, [(PF₃)₂RhCl]₂ (90.8 kJ mol^-1), were determined. The sublimation enthalpy for Mo(CO)₆ was larger by more than 10% in the measured temperature range than reported values measured at higher temperatures. At ambient temperatures, partial decomposition was observed only for the gold precursors.

Original language	English
Pages (from-to)	33-37
Number of pages	5
Journal	Advanced Materials
Volume	13
Issue number	2
Publication status	Published - Jan 2001

Cite this

@article{71b81a8d43f54e08ac45ae436a2780be,

title = "Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature",

abstract = "Static vapor pressure measurements of volatile metal precursors, in the pressure range 10-1 Pa to 103 Pa, are described. The vapor pressures and the sublimation or evaporation enthalpies, in the range 265 K-300 K, of Mo(CO)6 (77.7 kJ mol-1), two dimethyl(β-diketonato)gold(III) complexes, Me2Au(tfa) (83.5 kJ mol-1) and Me2(hfa) (68.1 kJ mol-1), and an inorganic Rh precursor, [(PF3)2RhCl]2 (90.8 kJ mol-1), were determined. The sublimation enthalpy for Mo(CO)6 was larger by more than 10\% in the measured temperature range than reported values measured at higher temperatures. At ambient temperatures, partial decomposition was observed only for the gold precursors.",

author = "Holdsworth, \{R. J.\} and Martin, \{P. A.\} and D. Raisbeck and J. Rivero and Sanders, \{H. E.\} and D. Sheel and Pemble, \{M. E.\}",

year = "2001",

month = jan,

language = "English",

volume = "13",

pages = "33--37",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "2",

}

TY - JOUR

T1 - Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

AU - Holdsworth, R. J.

AU - Martin, P. A.

AU - Raisbeck, D.

AU - Rivero, J.

AU - Sanders, H. E.

AU - Sheel, D.

AU - Pemble, M. E.

PY - 2001/1

Y1 - 2001/1

N2 - Static vapor pressure measurements of volatile metal precursors, in the pressure range 10-1 Pa to 103 Pa, are described. The vapor pressures and the sublimation or evaporation enthalpies, in the range 265 K-300 K, of Mo(CO)6 (77.7 kJ mol-1), two dimethyl(β-diketonato)gold(III) complexes, Me2Au(tfa) (83.5 kJ mol-1) and Me2(hfa) (68.1 kJ mol-1), and an inorganic Rh precursor, [(PF3)2RhCl]2 (90.8 kJ mol-1), were determined. The sublimation enthalpy for Mo(CO)6 was larger by more than 10% in the measured temperature range than reported values measured at higher temperatures. At ambient temperatures, partial decomposition was observed only for the gold precursors.

AB - Static vapor pressure measurements of volatile metal precursors, in the pressure range 10-1 Pa to 103 Pa, are described. The vapor pressures and the sublimation or evaporation enthalpies, in the range 265 K-300 K, of Mo(CO)6 (77.7 kJ mol-1), two dimethyl(β-diketonato)gold(III) complexes, Me2Au(tfa) (83.5 kJ mol-1) and Me2(hfa) (68.1 kJ mol-1), and an inorganic Rh precursor, [(PF3)2RhCl]2 (90.8 kJ mol-1), were determined. The sublimation enthalpy for Mo(CO)6 was larger by more than 10% in the measured temperature range than reported values measured at higher temperatures. At ambient temperatures, partial decomposition was observed only for the gold precursors.

UR - https://www.scopus.com/pages/publications/0035127033

M3 - Article

AN - SCOPUS:0035127033

SN - 0935-9648

VL - 13

SP - 33

EP - 37

JO - Advanced Materials

JF - Advanced Materials

IS - 2

ER -

Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

Abstract

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