Stochastic process design kits for photonic circuits based on polynomial chaos augmented macro-modelling

Fabrication tolerances can significantly degrade the performance of fabricated photonic circuits and process yield. It is essential to include these stochastic uncertainties in the design phase in order to predict the statistical behaviour of a device before the final fabrication. This paper presents a method to build a novel class of stochastic-based building blocks for the preparation of Process Design Kits for the analysis and design of photonic circuits. The proposed design kits directly store the information on the stochastic behaviour of each building block in the form of a generalized-polynomial-chaos-based augmented macro-model obtained by properly exploiting stochastic collocation and Galerkin methods. Using these macro-models, only a single deterministic simulation is required to compute the stochastic moments of any arbitrary photonic circuit, without the need of running a large number of time-consuming circuit simulations thereby dramatically improving simulation e ciency. The e ectiveness of the proposed approach is verified by means of classical photonic circuit examples with multiple uncertain variables.