| Original language | Undefined/Unknown |
|---|---|
| Journal | Appl. Phys. Lett |
| Publication status | Published - 2010 |
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Structural and Electrical Analysis of the Atomic Layer Deposition of HfO 2/n-In 0.53 Ga 0.47 As Capacitors with and without an Al 2 O 3 Interface Control Layer
- K Cherkaoui
- , SB Newcomb
- , F Crupi
- , PK Hurley
- , ME Pemble
Research output: Contribution to journal › Article › peer-review