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Structural and electrical investigation of MoS2 thin films formed by thermal assisted conversion of Mo metal

  • Ray Duffy
  • , Patrick Foley
  • , Bruno Filippone
  • , Gioele Mirabelli
  • , Dan O'Connell
  • , Brendan Sheehan
  • , Pat Carolan
  • , Michael Schmidt
  • , Karim Cherkaoui
  • , Riley Gatensby
  • , Toby Hallam
  • , Georg Duesberg
  • , Felice Crupi
  • , Roger Nagle
  • , Paul K. Hurleya

Research output: Contribution to journalArticlepeer-review

Abstract

Large-area synthesis is of great demand for the preparation of high-performance transition-metal-dichalcogenides (TMD) devices, however there are only limited reports to date of device operation on large-area TMDs. In this work we fabricate MoS2 devices based on Thermal Assisted Conversion (TAC) of metal layers, and characterize the thin-films with material analysis combined with electrical device parameter extraction. Specifically we report on temperature dependent parameter extraction for Ti/Au contacts to MoS2 thin-films to determine sheet resistance (Rsh), resistivity (ρ), and the activation energy (EA) of on-state current flow. For undoped MoS2, ρ was determined to be 191 ω.cm at 25°C. The activation energy of the on-state current was found to be 0.18 eV, pointing to the presence of deep levels in MoS2.

Original languageEnglish
Pages (from-to)Q3016-Q3020
JournalECS Journal of Solid State Science and Technology
Volume5
Issue number11
DOIs
Publication statusPublished - 2016

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