Abstract
Neopentyl iodide (NpI) has been shown to be an inefficient carbon-doping source for GaAs and AlGaAs, but is some two orders of magnitude more efficient in AlAs. This difference in NpI doping behaviour is attributed to a significant difference in the surface chemistry of NpI on AlAs, possibly due to a lack of reactive hydrogen during layer growth.
| Original language | English |
|---|---|
| Pages (from-to) | 286-289 |
| Number of pages | 4 |
| Journal | Journal of Crystal Growth |
| Volume | 209 |
| Issue number | 2-3 |
| DOIs | |
| Publication status | Published - Feb 2000 |
| Externally published | Yes |
| Event | The 7th International Conference on Chemical Beam Epitaxy and Related Growth Techniques - Tsukuba, Jpn Duration: 28 Jul 1999 → 30 Jul 1999 |