Study of low-K film repair and pore sealing using chlorosilanes dissolved in supercritical carbon dioxide

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

Original language	English
Title of host publication	2007 AIChE Annual Meeting
Publication status	Published - 2007
Externally published	Yes
Event	2007 AIChE Annual Meeting - Salt Lake City, UT, United States Duration: 4 Nov 2007 → 9 Nov 2007

Name	AIChE Annual Meeting, Conference Proceedings

Cite this

@inproceedings{a285b04b53e8432088fe19f44f0e0dec,

title = "Study of low-K film repair and pore sealing using chlorosilanes dissolved in supercritical carbon dioxide",

author = "Eduardo Vyhmeister and Lischen Choate and David Suleiman and Est{\'e}vez, \{L. Antonio\} and Anthony Muscat",

year = "2007",

language = "English",

isbn = "9780816910229",

series = "AIChE Annual Meeting, Conference Proceedings",

booktitle = "2007 AIChE Annual Meeting",

note = "2007 AIChE Annual Meeting ; Conference date: 04-11-2007 Through 09-11-2007",

}

TY - GEN

T1 - Study of low-K film repair and pore sealing using chlorosilanes dissolved in supercritical carbon dioxide

AU - Vyhmeister, Eduardo

AU - Choate, Lischen

AU - Suleiman, David

AU - Estévez, L. Antonio

AU - Muscat, Anthony

PY - 2007

Y1 - 2007

UR - https://www.scopus.com/pages/publications/80053656028

M3 - Conference proceeding

AN - SCOPUS:80053656028

SN - 9780816910229

T3 - AIChE Annual Meeting, Conference Proceedings

BT - 2007 AIChE Annual Meeting

T2 - 2007 AIChE Annual Meeting

Y2 - 4 November 2007 through 9 November 2007

ER -