TY - JOUR
T1 - Study of the growth conditions and characterization of CaCu2Ox and SrCu2Ox thin films
AU - Millon, C.
AU - Deschanvres, J. L.
AU - Jiménez, C.
AU - Macsporran, N.
AU - Servet, B.
AU - Durand, O.
AU - Modreanu, M.
PY - 2007/9/25
Y1 - 2007/9/25
N2 - MCu2O2 (M = Ca, Ba, Mg, Sr) are promising materials for the development of new p-type transparent conductive oxide thin films. We report on a study of the growth conditions of MCu2Ox (M = Ca, Sr) thin films by injection MOCVD and on the characterization of their structural properties. By using calcium or strontium, and copper tetramethylheptanedionate as precursors dissolved in meta-xylene, cuprate films added with either calcium or strontium have been grown by injection MOCVD in the 450 °C-750 °C deposition temperature range. The main factors for the deposition of films presenting good adherence and a high mirror reflection effect are the deposition temperature and the oxygen partial pressure during deposition. As-deposited Ca-based films are mainly composed of CaCu2O3 or a mixture of CaCO3, CaO, CuO and Cu2O, depending on the oxygen partial pressure and Sr-based films are composed of SrCO3, CuO. Different annealing under argon atmosphere has been performed in order to obtain the searched phase, which needs the reduction of copper in the 1+ oxidation state. We have succeeded to obtain SrCu2O2 phase by Rapid Thermal Processing but did not achieve to obtain the Ca-based compound.
AB - MCu2O2 (M = Ca, Ba, Mg, Sr) are promising materials for the development of new p-type transparent conductive oxide thin films. We report on a study of the growth conditions of MCu2Ox (M = Ca, Sr) thin films by injection MOCVD and on the characterization of their structural properties. By using calcium or strontium, and copper tetramethylheptanedionate as precursors dissolved in meta-xylene, cuprate films added with either calcium or strontium have been grown by injection MOCVD in the 450 °C-750 °C deposition temperature range. The main factors for the deposition of films presenting good adherence and a high mirror reflection effect are the deposition temperature and the oxygen partial pressure during deposition. As-deposited Ca-based films are mainly composed of CaCu2O3 or a mixture of CaCO3, CaO, CuO and Cu2O, depending on the oxygen partial pressure and Sr-based films are composed of SrCO3, CuO. Different annealing under argon atmosphere has been performed in order to obtain the searched phase, which needs the reduction of copper in the 1+ oxidation state. We have succeeded to obtain SrCu2O2 phase by Rapid Thermal Processing but did not achieve to obtain the Ca-based compound.
KW - Thin films
KW - Transparent conductive oxides
KW - XRD
UR - https://www.scopus.com/pages/publications/34547813624
U2 - 10.1016/j.surfcoat.2007.04.121
DO - 10.1016/j.surfcoat.2007.04.121
M3 - Article
AN - SCOPUS:34547813624
SN - 0257-8972
VL - 201
SP - 9395
EP - 9399
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - 22-23 SPEC. ISS.
ER -