Surfactant role of (TM)Sb in MOVPE growth of metamorphic InGaAs graded buffers

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

We present a virtual substrate for high quality InAs epitaxial layer, obtained via metalorganic vapor-phase epitaxy growth of Sb-assisted In xGa1-xAs metamorphic buffers, following a convex compositional continuous gradient of the In content from x = 53 % to 100 %. The use of Trimethylantimony (or its decomposition products) as a surfactant was found to be a suitable way to control defect formation during the relaxation process. Reliably uniform growth with good morphology was obtained on crystals with misorientation toward [111]B direction.

Original languageEnglish
Title of host publicationPhysics of Semiconductors - Proceedings of the 31st International Conference on the Physics of Semiconductors, ICPS 2012
PublisherAmerican Institute of Physics Inc.
Pages17-18
Number of pages2
ISBN (Print)9780735411944
DOIs
Publication statusPublished - 2013
Event31st International Conference on the Physics of Semiconductors, ICPS 2012 - Zurich, Switzerland
Duration: 29 Jul 20123 Aug 2012

Publication series

NameAIP Conference Proceedings
Volume1566
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference31st International Conference on the Physics of Semiconductors, ICPS 2012
Country/TerritorySwitzerland
CityZurich
Period29/07/123/08/12

Keywords

  • InAs
  • InGaAs
  • metamorphic buffer
  • MOVPE
  • surfactant
  • TMSb

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