Temperature and frequency dependent electrical characterization of HfO 2/In x Ga 1- x As interfaces using capacitance-voltage and conductance methods

Ailbe O'Manachain

doi:10.1063/1.3089688

Temperature and frequency dependent electrical characterization of HfO 2/In x Ga 1- x As interfaces using capacitance-voltage and conductance methods

Ailbe O'Manachain

Tyndall MicroNano Systems

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Applied Physics Letters
DOIs	https://doi.org/10.1063/1.3089688
Publication status	Published - 2009

Access to Document

10.1063/1.3089688

Cite this

@article{05e02419808d4c73b6db1ebe6e8f2bd2,

title = "Temperature and frequency dependent electrical characterization of HfO 2/In x Ga 1- x As interfaces using capacitance-voltage and conductance methods",

author = "Ailbe O'Manachain",

year = "2009",

doi = "10.1063/1.3089688",

language = "Undefined/Unknown",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

}