Test structures for a MEMS SiOx/metal process

Martin Hill; Conor O'Mahony; P. J. Hughes; Bill Lane; Alan Mathewson

Test structures for a MEMS SiO_x/metal process

Martin Hill
, Conor O'Mahony
, P. J. Hughes
, Bill Lane
, Alan Mathewson

University College Cork

Research output: Contribution to conference › Paper › peer-review

Abstract

A CMOS-compatible surface micromachining process was established in which a range of microstructures was fabricated. A semi-analytical model describing the pull-in behavior of fixed-fixed beams was defined which takes into account the substantial stress absorption which was shown to take place likely at non-ideal beam anchors. Using this model, the elastic modulus and residual stress of the titanium were evaluated. Interferometry imaging and capacitance measurements were used to show that the anchor design used remains undeformed even under high voltages.

Original language	English
Pages	203-210
Number of pages	8
Publication status	Published - 2002
Event	Proceedings of The 2002 International Conference on Microelectronic Test Structures - Cork, Ireland Duration: 8 Apr 2002 → 11 Apr 2002

Conference

Conference	Proceedings of The 2002 International Conference on Microelectronic Test Structures
Country/Territory	Ireland
City	Cork
Period	8/04/02 → 11/04/02

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Cite this

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title = "Test structures for a MEMS SiOx/metal process",

abstract = "A CMOS-compatible surface micromachining process was established in which a range of microstructures was fabricated. A semi-analytical model describing the pull-in behavior of fixed-fixed beams was defined which takes into account the substantial stress absorption which was shown to take place likely at non-ideal beam anchors. Using this model, the elastic modulus and residual stress of the titanium were evaluated. Interferometry imaging and capacitance measurements were used to show that the anchor design used remains undeformed even under high voltages.",

author = "Martin Hill and Conor O'Mahony and Hughes, \{P. J.\} and Bill Lane and Alan Mathewson",

year = "2002",

language = "English",

pages = "203--210",

note = "Proceedings of The 2002 International Conference on Microelectronic Test Structures ; Conference date: 08-04-2002 Through 11-04-2002",

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TY - CONF

T1 - Test structures for a MEMS SiOx/metal process

AU - Hill, Martin

AU - O'Mahony, Conor

AU - Hughes, P. J.

AU - Lane, Bill

AU - Mathewson, Alan

PY - 2002

Y1 - 2002

N2 - A CMOS-compatible surface micromachining process was established in which a range of microstructures was fabricated. A semi-analytical model describing the pull-in behavior of fixed-fixed beams was defined which takes into account the substantial stress absorption which was shown to take place likely at non-ideal beam anchors. Using this model, the elastic modulus and residual stress of the titanium were evaluated. Interferometry imaging and capacitance measurements were used to show that the anchor design used remains undeformed even under high voltages.

AB - A CMOS-compatible surface micromachining process was established in which a range of microstructures was fabricated. A semi-analytical model describing the pull-in behavior of fixed-fixed beams was defined which takes into account the substantial stress absorption which was shown to take place likely at non-ideal beam anchors. Using this model, the elastic modulus and residual stress of the titanium were evaluated. Interferometry imaging and capacitance measurements were used to show that the anchor design used remains undeformed even under high voltages.

UR - https://www.scopus.com/pages/publications/0037481693

M3 - Paper

AN - SCOPUS:0037481693

SP - 203

EP - 210

T2 - Proceedings of The 2002 International Conference on Microelectronic Test Structures

Y2 - 8 April 2002 through 11 April 2002

ER -

Test structures for a MEMS SiO_x/metal process

Abstract

Conference

UN SDGs

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