The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor

N. Saeidi; A. Blake; C. Colinge; M. Burke; A. J. Quinn; A. Demosthenous; N. Donaldson

doi:10.1149/1.3653925

The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor

N. Saeidi
, A. Blake
, C. Colinge
, M. Burke
, A. J. Quinn
, A. Demosthenous
, N. Donaldson

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

Abstract

Measuring the change in electrical properties of materials in the presence of moisture is a widely used method for humidity measurement. During the fabrication of a thin film humidity sensor, different layers of the device, as well as its moisture sensing film, undergo a series of commonly used manufacturing steps. Plasma treatment is one of these steps, primarily used for dry etching. However, exposing a moisture sensing film to plasma can modify physical and chemical properties of the film and affect sensor performance. We have examined the response of two humidity sensors fabricated using polyimide sensing film, one of them received plasma treatment during fabrication and the other did not. Despite the fact that the sensors were of similar design they exhibited different responses. Further investigations were conducted by examining the effects of plasma treatment on blanket polyimide films and the results are presented in this paper.

Original language	English
Title of host publication	Sensors, Actuators, and Microsystems (General) - 219th ECS Meeting
Pages	71-78
Number of pages	8
Edition	30
DOIs	https://doi.org/10.1149/1.3653925
Publication status	Published - 2011
Event	Sensors, Actuators, and Microsystems General Session - 219th ECS Meeting - Montreal, QC, Canada Duration: 1 May 2011 → 6 May 2011

Publication series

Name	ECS Transactions
Number	30
Volume	35
ISSN (Print)	1938-5862
ISSN (Electronic)	1938-6737

Conference

Conference	Sensors, Actuators, and Microsystems General Session - 219th ECS Meeting
Country/Territory	Canada
City	Montreal, QC
Period	1/05/11 → 6/05/11

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

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10.1149/1.3653925

Cite this

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title = "The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor",

abstract = "Measuring the change in electrical properties of materials in the presence of moisture is a widely used method for humidity measurement. During the fabrication of a thin film humidity sensor, different layers of the device, as well as its moisture sensing film, undergo a series of commonly used manufacturing steps. Plasma treatment is one of these steps, primarily used for dry etching. However, exposing a moisture sensing film to plasma can modify physical and chemical properties of the film and affect sensor performance. We have examined the response of two humidity sensors fabricated using polyimide sensing film, one of them received plasma treatment during fabrication and the other did not. Despite the fact that the sensors were of similar design they exhibited different responses. Further investigations were conducted by examining the effects of plasma treatment on blanket polyimide films and the results are presented in this paper.",

author = "N. Saeidi and A. Blake and C. Colinge and M. Burke and Quinn, \{A. J.\} and A. Demosthenous and N. Donaldson",

year = "2011",

doi = "10.1149/1.3653925",

language = "English",

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series = "ECS Transactions",

number = "30",

pages = "71--78",

booktitle = "Sensors, Actuators, and Microsystems (General) - 219th ECS Meeting",

edition = "30",

note = "Sensors, Actuators, and Microsystems General Session - 219th ECS Meeting ; Conference date: 01-05-2011 Through 06-05-2011",

}

Saeidi, N, Blake, A, Colinge, C, Burke, M, Quinn, AJ, Demosthenous, A & Donaldson, N 2011, The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor. in Sensors, Actuators, and Microsystems (General) - 219th ECS Meeting. 30 edn, ECS Transactions, no. 30, vol. 35, pp. 71-78, Sensors, Actuators, and Microsystems General Session - 219th ECS Meeting, Montreal, QC, Canada, 1/05/11. https://doi.org/10.1149/1.3653925

The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor. / Saeidi, N.; Blake, A.; Colinge, C. et al.
Sensors, Actuators, and Microsystems (General) - 219th ECS Meeting. 30. ed. 2011. p. 71-78 (ECS Transactions; Vol. 35, No. 30).

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

TY - GEN

T1 - The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor

AU - Saeidi, N.

AU - Blake, A.

AU - Colinge, C.

AU - Burke, M.

AU - Quinn, A. J.

AU - Demosthenous, A.

AU - Donaldson, N.

PY - 2011

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N2 - Measuring the change in electrical properties of materials in the presence of moisture is a widely used method for humidity measurement. During the fabrication of a thin film humidity sensor, different layers of the device, as well as its moisture sensing film, undergo a series of commonly used manufacturing steps. Plasma treatment is one of these steps, primarily used for dry etching. However, exposing a moisture sensing film to plasma can modify physical and chemical properties of the film and affect sensor performance. We have examined the response of two humidity sensors fabricated using polyimide sensing film, one of them received plasma treatment during fabrication and the other did not. Despite the fact that the sensors were of similar design they exhibited different responses. Further investigations were conducted by examining the effects of plasma treatment on blanket polyimide films and the results are presented in this paper.

AB - Measuring the change in electrical properties of materials in the presence of moisture is a widely used method for humidity measurement. During the fabrication of a thin film humidity sensor, different layers of the device, as well as its moisture sensing film, undergo a series of commonly used manufacturing steps. Plasma treatment is one of these steps, primarily used for dry etching. However, exposing a moisture sensing film to plasma can modify physical and chemical properties of the film and affect sensor performance. We have examined the response of two humidity sensors fabricated using polyimide sensing film, one of them received plasma treatment during fabrication and the other did not. Despite the fact that the sensors were of similar design they exhibited different responses. Further investigations were conducted by examining the effects of plasma treatment on blanket polyimide films and the results are presented in this paper.

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ER -

The effects of fabrication process on the performance of a CMOS based capacitive humidity sensor

Abstract

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UN SDGs

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