The Growth of Indium Selenide Thin Films from a Novel Asymmetric Dialkyldiselenocarbamate of Indium

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Abstract

Thin films of cubic In2Se3 have been grown by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) using the novel precursor In(Se2CNMe n-hexyl)3. The precursor was prepared from carbon diselenide and a modified experimental procedure for the synthesis of CSe2 is described. Films were grown on glass and InP(111) between 450 and 500°C, and characterized by X-ray diffraction and scanning electron microscopy.

Original languageEnglish
Pages (from-to)227-229
Number of pages3
JournalChemical Vapor Deposition
Volume3
Issue number4
DOIs
Publication statusPublished - Aug 1997
Externally publishedYes

Keywords

  • Indium selenide
  • MOCVD

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