TY - JOUR
T1 - The growth of thermochromic VO2 films on glass by atmospheric-pressure CVD
T2 - A comparative study of precursors, CVD methodology, and substrates
AU - Vernardou, Dimitra
AU - Pemble, Martyn E.
AU - Sheel, David W.
PY - 2006/5
Y1 - 2006/5
N2 - This paper briefly reviews previous work on the growth of thermochromic VO2 thin films on glass, and then examines and compares three different CVD approaches and two precursor systems for the production of these materials. It is found that atmospheric pressure (AP) CVD using vanadium(IV) chloride (VCl4) and H2O on commercial SiO 2-precoated glass yields the smoothest films, with transition temperature (Tc) values of around 58°C, while APCVD using vanadyl(IV) acetyl acetonate (VO(acac)2) on the same substrates produces slightly rougher films, which are more crystalline and possess a T c with a value as low as 51.5°C. Films grown using VO(acac) 2 in a direct liquid-injection metal-organic (DLI-MO) CVD reactor exhibited considerably poorer thermochromic and morphological properties as compared with those grown by APCVD. These findings are discussed in terms of possible variations in growth mechanisms occurring during the three processes studied.
AB - This paper briefly reviews previous work on the growth of thermochromic VO2 thin films on glass, and then examines and compares three different CVD approaches and two precursor systems for the production of these materials. It is found that atmospheric pressure (AP) CVD using vanadium(IV) chloride (VCl4) and H2O on commercial SiO 2-precoated glass yields the smoothest films, with transition temperature (Tc) values of around 58°C, while APCVD using vanadyl(IV) acetyl acetonate (VO(acac)2) on the same substrates produces slightly rougher films, which are more crystalline and possess a T c with a value as low as 51.5°C. Films grown using VO(acac) 2 in a direct liquid-injection metal-organic (DLI-MO) CVD reactor exhibited considerably poorer thermochromic and morphological properties as compared with those grown by APCVD. These findings are discussed in terms of possible variations in growth mechanisms occurring during the three processes studied.
KW - APCVD
KW - Thermochromic properties
KW - Vanadium(IV) chloride
KW - Vanadium(IV) oxide
KW - Vanadyl(IV) acetyl acetonate
UR - https://www.scopus.com/pages/publications/34547872972
U2 - 10.1002/cvde.200506419
DO - 10.1002/cvde.200506419
M3 - Article
AN - SCOPUS:34547872972
SN - 0948-1907
VL - 12
SP - 263
EP - 274
JO - Chemical Vapor Deposition
JF - Chemical Vapor Deposition
IS - 5
ER -