The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

M. Kemmler; M. Lazell; P. O'Brien; D. J. Otway; Jin Ho Park; J. R. Walsh

doi:10.1023/A:1019665428255

The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

M. Kemmler
, M. Lazell
, P. O'Brien
, D. J. Otway
, Jin Ho Park
, J. R. Walsh

Imperial College London
University of Manchester

Research output: Contribution to journal › Article › peer-review

Abstract

Highly oriented crystalline films of copper sulfide and copper selenide have been grown on glass by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) and by aerosol-assisted chemical vapor deposition (AACVD), using the novel air-stable compounds [Cu(E₂CNMeⁿHex)₂]* (where E = S,Se). The films of non-stoichiometric cubic CuS and CuSe have been deposited in the temperature range 450-500°C.

Original language	English
Pages (from-to)	531-535
Number of pages	5
Journal	Journal of Materials Science: Materials in Electronics
Volume	13
Issue number	9
DOIs	https://doi.org/10.1023/A:1019665428255
Publication status	Published - Sep 2002
Externally published	Yes

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title = "The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors",

abstract = "Highly oriented crystalline films of copper sulfide and copper selenide have been grown on glass by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) and by aerosol-assisted chemical vapor deposition (AACVD), using the novel air-stable compounds [Cu(E2CNMenHex)2]* (where E = S,Se). The films of non-stoichiometric cubic CuS and CuSe have been deposited in the temperature range 450-500°C.",

author = "M. Kemmler and M. Lazell and P. O'Brien and Otway, \{D. J.\} and Park, \{Jin Ho\} and Walsh, \{J. R.\}",

year = "2002",

month = sep,

doi = "10.1023/A:1019665428255",

language = "English",

volume = "13",

pages = "531--535",

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T1 - The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

AU - Kemmler, M.

AU - Lazell, M.

AU - O'Brien, P.

AU - Otway, D. J.

AU - Park, Jin Ho

AU - Walsh, J. R.

PY - 2002/9

Y1 - 2002/9

N2 - Highly oriented crystalline films of copper sulfide and copper selenide have been grown on glass by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) and by aerosol-assisted chemical vapor deposition (AACVD), using the novel air-stable compounds [Cu(E2CNMenHex)2]* (where E = S,Se). The films of non-stoichiometric cubic CuS and CuSe have been deposited in the temperature range 450-500°C.

AB - Highly oriented crystalline films of copper sulfide and copper selenide have been grown on glass by low-pressure metal-organic chemical vapor deposition (LP-MOCVD) and by aerosol-assisted chemical vapor deposition (AACVD), using the novel air-stable compounds [Cu(E2CNMenHex)2]* (where E = S,Se). The films of non-stoichiometric cubic CuS and CuSe have been deposited in the temperature range 450-500°C.

UR - https://www.scopus.com/pages/publications/0036755377

U2 - 10.1023/A:1019665428255

DO - 10.1023/A:1019665428255

M3 - Article

AN - SCOPUS:0036755377

SN - 0957-4522

VL - 13

SP - 531

EP - 535

JO - Journal of Materials Science: Materials in Electronics

JF - Journal of Materials Science: Materials in Electronics

IS - 9

ER -

The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

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