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The impact of forming gas annealing on the properties of interfaces between atomic layer deposited Al2O3 & sulphur passivated molecular beam epitaxially grown (110) p-& n-type In0. 53Ga0. 47As surfaces

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
JournalJournal of Applied Physics
Publication statusPublished - 2010

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