The (R)evolution of the junctionless transistor

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

In the junctionless transistor [1] the doping type and concentration in the channel region is essentially equal to that in the source and drain, or at least to that in the source and drain extensions. This paper will first focus on the Revolution of the junctionless transistor, concentrating on the initial reports and studies in 2009. Then the Evolution of the junctionless transistor will be discussed since those early reports in 2009. A variety of studies will be reviewed, as junctionless transistors are being reported in many more materials other than Si, such as in Ge and InGaAs, and very recently in MoS2 and in other transition-metal-dichalcogenide semiconductors.

Original languageEnglish
Title of host publicationSilicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6
EditorsF. Roozeboom, V. Narayanan, K. Kakushima, P. J. Timans, E. P. Gusev, Z. Karim, S. De Gendt
PublisherElectrochemical Society Inc.
Pages115-126
Number of pages12
Edition4
ISBN (Electronic)9781607687146
DOIs
Publication statusPublished - 2016
EventSymposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 - 229th ECS Meeting - San Diego, United States
Duration: 29 May 20162 Jun 2016

Publication series

NameECS Transactions
Number4
Volume72
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 - 229th ECS Meeting
Country/TerritoryUnited States
CitySan Diego
Period29/05/162/06/16

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