The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications

B Toomey; Karim Cherkaoui; Scott Monaghan; Vladimir Djara; Éamon O’Connor; D O’Connell; L Oberbeck; E Tois; T Blomberg; SB Newcomb; others

The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications

B Toomey
, Karim Cherkaoui
, Scott Monaghan
, Vladimir Djara
, Éamon O’Connor
, D O’Connell
, L Oberbeck
, E Tois
, T Blomberg
, SB Newcomb
, others

Tyndall MicroNano Systems

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Microelectronic Engineering
Publication status	Published - 2012

Cite this

@article{4a009c207bc24169bde18b50222aef8c,

title = "The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications",

author = "B Toomey and Karim Cherkaoui and Scott Monaghan and Vladimir Djara and {\'E}amon O{\textquoteright}Connor and D O{\textquoteright}Connell and L Oberbeck and E Tois and T Blomberg and SB Newcomb and others",

year = "2012",

language = "Undefined/Unknown",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications

AU - Toomey, B

AU - Cherkaoui, Karim

AU - Monaghan, Scott

AU - Djara, Vladimir

AU - O’Connor, Éamon

AU - O’Connell, D

AU - Oberbeck, L

AU - Tois, E

AU - Blomberg, T

AU - Newcomb, SB

AU - others,

PY - 2012

Y1 - 2012

M3 - Article

SN - 0167-9317

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -