Abstract
Al/InxGa1-xAs(001) diodes incorporating Si bilayers deposited under As or Al flux were fabricated by molecular-beam epitaxy on GaAs(001) wafers for 0.2<x<0.4. Schottky barrier heights as high as 0.75 eV and as low as -0.10 eV could be reproducibly obtained. Diodes engineered for high barrier height systematically showed a higher thermal stability than low-barrier diodes. We discuss the composition dependence of the barrier height and the observed degradation behavior vis-a-vis of the predictions of the interface-dipole model of Schottky barrier tuning.
| Original language | English |
|---|---|
| Pages (from-to) | 2119-2127 |
| Number of pages | 9 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 18 |
| Issue number | 4 |
| Publication status | Published - 2000 |
| Externally published | Yes |
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