VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties
- Jean Pierre Glauber
- , Julian Lorenz
- , Ji Liu
- , Marietta Seifert
- , Volker Hoffmann
- , Carlos Abad
- , Detlef Rogalla
- , Lars Giebeler
- , Corinna Harms
- , Michael Wark
- , Michael Nolan
- , Anjana Devi
- Leibniz Institute for Solid State and Materials Research Dresden
- Ruhr University Bochum
- German Aerospace Center
- Federal Institute for Materials Research and Testing Berlin
- University of Oldenburg
- Technische Universität Dresden
- Fraunhofer Institute for Microelectronic Circuits and Systems
Research output: Contribution to journal › Article › peer-review