Wafer bonded Ge-Si heterostructure for avalanche photodiode application

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Abstract

In this study, we investigate directly bonded germanium-silicon interfaces to facilitate the development of high quality germanium silicon integration for Avalanche photodiode application. Angle resolved x-ray photoelectron spectroscopy data is presented which provides the chemical composition of the germanium surfaces as a function of the surface passivation. The hetero-structure is characterized by measuring forward and reverse current and comparing the measured results to TCAD simulation. The physical structure of hetero-junction is supported by high resolution transmission electron microscopy.

Original languageEnglish
Title of host publicationInterface Engineering for Post-CMOS Emerging Channel Materials
Pages38-43
Number of pages6
DOIs
Publication statusPublished - 2011
Event2011 MRS Spring Meeting - San Francisco, CA, United States
Duration: 25 Apr 201129 Apr 2011

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1336
ISSN (Print)0272-9172

Conference

Conference2011 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period25/04/1129/04/11

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